What is BiCMOS technology?
Bipolar CMOS (BiCMOS) is a semiconductor technology that integrates two formerly separate semiconductor technologies, those of the bipolar junction transistor and the CMOS (complementary metal-oxide-semiconductor) gate, in a single integrated circuit device.
How does BiCMOS technology work?
BiCMOS technology combines Bipolar and CMOS transistors in a single integrated circuit. By retaining the benefits of Bipolar and CMOS, BiCMOS is able to achieve VLSI circuits with speed-power-density performance previously unattainable with either technology individually.
What are the fabrication steps of CMOS using N-well process?
CMOS Fabrication Steps
- Substrate.
- Oxidation.
- Growing of Photoresist.
- Masking of Photoresist.
- Removal of Photoresist.
- Etching of SiO2.
- Removal of Photoresist Layer.
- Formation of N-well.
What are the features of BiCMOS?
Some of the features of BiCMOS are low input impedance, low packing density, unidirectional, high output drive current etc. BiCMOS has low power dissipation. Solution: BiCMOS has high power dissipation and CMOS has low power dissipation.
What are the advantages of BiCMOS technology?
It follows that BiCMOS technology offers the advantages of: 1) improved speed over CMOS, 2) lower power dissipation than Bipolar (which simplifies packaging and board requirements), 3) flexible I/Os (TTL, CMOS, or ECL), 4) high performance analog, and 5) latchup immunity [1.2].
What is BCD technology?
BCD is a family of silicon processes, each of which combines the strengths of three different process technologies onto a single chip: Bipolar for precise analog functions, CMOS (Complementary Metal Oxide Semiconductor) for digital design and DMOS (Double Diffused Metal Oxide Semiconductor) for power and high-voltage …
What is difference between CMOS and BiCMOS?
BiCMOS combines both Bipolar and CMOS technologies in single IC. As we know CMOS has merits over bipolar in areas of low power dissipation, large noise margins and greater packing densities. Bipolar has merits over CMOS in areas of faster switching speed and large current cababilities.
What is P-well fabrication process?
Step 1 : A thin layer of SiO2 is deposited which will serve as the pad oxide. Step 2 : A thicker sacrificial silicon nitride layer is deposited by chemical vapour deposition (CVD). Step 3 : A plasma etching process is used to create trenches used for insulating the devices.
What is the work of BJT in BiCMOS?
Explanation: In BiCMOS, bipolar transistors are used to drive output loads. Bipolar transistor can also be used as amplifier, switch or as an oscillator.
What are features of BiCMOS?